Interfacial Engineering of Solution-Processed n-Type Organic Semiconductor Thin Films for High-Performance Transistors

Authors: Liyang Chen¹, Xiaoxuan Wang², Zhiqiang Liu¹*, Yuguang Ma¹

Journal: J. Phys. Chem. Lett. 2025, 16(12), 3456-3463

DOI: 10.1021/acs.jpclett.5c01184

1. Abstract

This work addresses the long-standing challenge of unstable interfaces in solution-processed n-type organic field-effect transistors (OFETs). By introducing a novel fluorinated self-assembled monolayer (SAM) treatment, we achieved:

The interfacial mechanism was elucidated via in-situ XPS and Kelvin probe force microscopy, revealing optimized dipole alignment and suppressed water adsorption.

2. Experimental Design

Schematic of SAM treatment process
Figure 1. Schematic illustration of the fluorinated SAM treatment workflow on SiO₂/Si substrates. Inset: AFM image (5×5 μm²) showing uniform TIPS-PEN film morphology after treatment.

Key steps:

  1. Substrate pretreatment: O₂ plasma cleaning (100W, 5min)
  2. SAM deposition: 0.5 mM 1H,1H,2H,2H-perfluorodecanethiol (PFDT) in ethanol, 60℃ for 2h
  3. Film fabrication: Spin-coating TIPS-PEN (15 mg/mL in chlorobenzene) at 1000 rpm
  4. Characterization: XRD, AFM, UPS, and OFET device testing

3. Key Findings

The SAM-treated films exhibited:

Transfer characteristics of OFET devices
Figure 2. Transfer curves of TIPS-PEN OFETs with (red) and without (black) SAM treatment. Inset: Mobility distribution from 50 devices.

4. Publication Resources

Supporting Information ← Return to Group Achievements